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Semiconductor Inspection Metallographic Microscope INTJ-51

The semiconductor inspection microscope INTJ-51 adopts a large stroke mobile working platform and a long working distance semi achromatic objective lens. Its image is sharp and clear. It is widely used in various industrial tests such as wafer and FPD.
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  • INTJ-51

  • CAIDAO

4-inch working platform semiconductor inspection microscope

The semiconductor inspection microscope INTJ-51 adopts a large stroke mobile working platform and a long working distance semi achromatic objective lens. Its image is sharp and clear. It is widely used in various industrial tests such as wafer and FPD.

1. Stable frame structure design

The industrial inspection grade microscope body and the low center of gravity, high rigidity and high stability metal frame ensure the seismic resistance and imaging stability of the system.


INTJ-51 P3


Its front low hand coarse fine tuning coaxial focusing mechanism, built-in 100-240V wide voltage transformer, can adapt to the power grid voltage in different regions. Air circulation cooling system is designed inside the base, which will not overheat the rack after long-term use.



2. Reflection illuminator

Single high-power 5W white LED lighting, with oblique lighting mechanism. When switching to oblique lighting, it can make different material parts of the object surface present three-dimensional patterns, and increase the contrast and visual effect of observation.


INTJ-51 P4




3. High performance objective lens converter

INTJ-51 converter adopts precision bearing design, which makes the rotation feel light and comfortable, and has high repeated positioning accuracy. The concentricity of the objective lens after conversion is also well controlled. The converter with different hole positions can be configured according to the needs.

INTJ-51 P5


Semiconductor inspection microscope INTJ-51 technique parameters

Optional observation methods

Bright field / dark field / polarized light /DIC/ transmitted light

Optical system

Infinite chromatic aberration correction optical system

Eyepiece

PL10X/22 Flat field high eye point eyepiece

Observation tube

30 ° hinged three eye, spectral ratio, binocular: three eye =100:0 or 50:50

Objective

LMPL Infinitely long working distance metallographic objective 5X、10X、20X、50X、100X(optional)

Converter

5-hole tilt in converter with DIC slot

Stage

4 "double-layer mechanical mobile platform, stroke 105x 105mm, right-hand X and Y mobile handwheels, equipped with platform interface.

Microscope body

Coarse fine adjustment coaxial, coarse adjustment stroke 33mm, fine adjustment accuracy 0.001mm, with coarse adjustment mechanism upper limit and elastic adjustment device. Built in 90-240v wide voltage transformer, dual power output.

Reflex illuminator system

With variable field of view diaphragm and aperture diaphragm, the center can be adjusted; With color filter slot and polarizing device slot; With diagonal lighting switching rod. 12v100w halogen lamp with continuously adjustable light intensity (MX-6R microscope body should be used when selecting this group of illuminators).

Transmission lighting system (optional)

Single high-power 5W led, white, continuously adjustable light intensity. N. A. 0.5 condenser with variable aperture diaphragm.



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