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INTJ-51A
CAIDAO
The new 12 inch large platform semiconductor/FPD inspection microscope supports the inspection of ≤ 300mm wafers and 17 inch LCD panels, including 4, 6, 8 and 12 inch turntables, which can be used for wafer inspection of different sizes. Ergonomic design is improved to provide users with more flexible and fast operation experience.
The 0-35 ° observation angle is adjustable, which is suitable for users of different heights, reduces the requirements for the working environment, enables different users to find a good observation angle, reduces the discomfort and fatigue caused by long-time work, and greatly improves the work efficiency.
The INTJ-51A adopts a clutch handle. The user can move the platform flexibly by pressing the clutch wrench, without having to pinch the handle for a long time; Press the clutch button to cancel the rapid movement. Avoid hand numbness during long-time operation and speed up observation. INTJ-51A introduces a precision guide rail transmission mechanism, which makes the movement lighter and smoother, and the product more stable and reliable.
It is equipped with forward and backward gear switching modes, which can quickly and accurately locate the required observation magnification, and the repeated positioning accuracy is high. The mechanical switching mode effectively improves the service life of the converter.
The INTJ-51A objective lens and aperture diaphragm adopt a brand-new electric control system, and its operation keys are located in the front of the instrument, so that you can reach them. The humanized electric design not only avoids frequent manual operation steps, but also makes your detection more accurate and flexible.
The fuselage is supported by six end brackets, with a low center of gravity and a high stability all metal frame. It has a good anti-seismic function to ensure the stability of image quality.
The INTJ-51A fuselage is made of all metal materials, with excellent stability. There are built-in handling devices at both ends of the bottom. During handling, users only need to rotate and screw out the built-in handling handle and screw it in in in the opposite direction to form a solid handling device. The setting of this device can evenly distribute the weight of the machine, and only two people are needed to complete the handling, effectively avoiding many problems in the handling process, such as no way to start, difficult movement, uneven weight distribution, collision and so on. In order to prevent damage caused by the movement of the instrument platform during handling, the platform can be locked to ensure the safety and stability of the instrument.
The aperture diaphragm and objective lens magnification are automatically matched without manual adjustment, which is faster and more efficient, allowing different users to have the same observation effect. In the dark field mode, the diaphragm opens automatically, which reduces the professional technical requirements of the user for the microscope and simplifies the microscopic observation.
● the newly upgraded INTJ-51AMOT, fully automatic operation mode, makes your detection work more efficient.
● X\Y\Z three axis electric control, electric objective lens conversion, and automatic aperture diaphragm matching.
● the movement of X, y and Z axes of the 12 inch platform can be controlled by software or handle to complete the image mosaic function and perfectly observe and analyze the global image.
● the independent operating handle makes the platform movement more simple and convenient, and avoids the platform damage caused by improper operation of personnel.
INTJ-51A integrates various observation functions such as bright field, dark field, polarizing, DIC, etc. It is widely used in semiconductor, FPD, circuit packaging, circuit substrates, materials, castings, cermet parts, precision abrasives, etc.
Various accessories can meet a variety of working environments and observation modes to show you real and clear microscopic images.
● An eyepiece with 25mm wide field of view is configured. Compared with the conventional 22mm field of view, the field of view is more flat and broad, and the edges of the field of view can be clear and bright, giving users a more comfortable visual experience.
● provide a more flat observation range and improve work efficiency. The larger range of diopter adjustment can meet the needs of more users.
● Equipped with a full set of professional semi achromatic metallographic objective lenses, high transmittance lenses and advanced coating technology.
● The long working distance design can effectively avoid the collision between the objective lens and the sample when the user switches. 20x long working distance objective lens is configured to meet the needs of industrial testing field.
● Each lens is strictly selected with high transmittance lens and advanced coating technology, which can truly restore the natural color of the sample.
Model | Magnification | Numerical aperture | Working distance | Cover glass thickness | Parfocal distance | Conjugate distance |
（N.A） | (mm) | (mm) | (mm) | (mm) | ||
Infinite bright and dark field semi vanishing metallographic DIC objective | 5X | 0.15 | 13.5 | - | 45 | ∞ |
10X | 0.3 | 9 | - | |||
20X | 0.5 | 2.5 | 0 | |||
50X | 0.8 | 1 | 0 | |||
100X | 0.9 | 1 | 0 | |||
Infinite long working distance bright and dark field semi vanishing metallographic DIC objective | 20X | 0.4 | 8.5 | 0 | 45 | ∞ |
Semi complex metallographic objective with infinite working distance in bright and dark field | 50X | 0.55 | 7.5 | 0 | 45 | ∞ |
100X | 0.8 | 2.1 | ||||
Infinite bright field semi complex elimination DIC objective | 5X | 0.15 | 19.5 | - | 45 | ∞ |
10X | 0.3 | 10.9 | - | |||
20X | 0.5 | 3.2 | 0 | |||
50X | 0.8 | 1.2 | 0 | |||
100X | 0.9 | 1 | 0 |
● With high-performance differential interference module, the subtle height difference that cannot be detected under bright field observation can be transformed into high contrast shading difference and displayed in the form of three-dimensional relief. It is widely used in LCD conductive particles, precision disk surface scratch detection and other fields.
Optical system | Infinite chromatic aberration correction optical system |
Observation method | Bright field / dark field / polarization/DIC |
Observing tube | Infinite hinged tee observation tube, 0-35 ° angle adjustable, positive image, pupil distance adjustment: 50-76mm, spectral ratio 100:0 or 0:100 |
Eyepiece | High eye point large field flat field eyepiece pl10x/25mm, visibility adjustable, with single scale cross dividing plate |
Objective | Infinite bright and dark field semi vanishing metallographic DIC objective 5X 10X 20X 50X 100X |
Infinite long working distance bright and dark field semi vanishing metallographic DIC objective 20X | |
Infinite long working distance bright and dark field semi vanishing metallographic objective 50X 100X | |
Converter | Light and dark field six hole electric converter with DIC slot |
Rack group | Reflective frame, front low hand coarse micro coaxial focusing mechanism. Rough adjustment stroke is 35mm, and fine adjustment accuracy is 0.001mm. It is equipped with an adjusting and tightening device to prevent sliding and a random upper limit device. Built in 100-240V wide voltage system. |
Transparent and reflective frame, front low hand coarse and micro coaxial focusing mechanism. Rough adjustment stroke is 35mm, and fine adjustment accuracy is 0.001mm. It is equipped with an adjusting and tightening device to prevent sliding and a random upper limit device. Built in 100-240V wide voltage system. | |
Stage | Right hand position 14 × 12 inch three-layer mechanical mobile platform, coaxial adjustment in X and Y directions of low hand position; Platform area: 718mmx420mm, moving range: 356mmx305mm; With clutch handle, it can be used for rapid movement within the full stroke range; Glass carrier plate (for reflection). |
Electric platform | Electric platform: Area: 495mmx641mm, moving range: 306mmx306mm; The software controls the X and Y movements and repeats the positioning accuracy, (3+l/50) μm with flat platform. |
Lighting | Bright and dark field reflection illuminator, with variable electric aperture diaphragm, field diaphragm and adjustable center; With light and dark field lighting switching device; With color filter slot and polarizer slot. |
Photographic accessories | 0.5X/0.65X/1X camera adapter, C-type interface, focusing. |
Others | Polarizer insert plate, fixed polarizer insert plate, interference filter group for reflection; High precision micrometer; DIC assembly. |
Camera | Equipped with 6MP, 12MP and 20MP HD CCD cameras availble. |
Software | Professional measurement software and customized detection software. |
The new 12 inch large platform semiconductor/FPD inspection microscope supports the inspection of ≤ 300mm wafers and 17 inch LCD panels, including 4, 6, 8 and 12 inch turntables, which can be used for wafer inspection of different sizes. Ergonomic design is improved to provide users with more flexible and fast operation experience.
The 0-35 ° observation angle is adjustable, which is suitable for users of different heights, reduces the requirements for the working environment, enables different users to find a good observation angle, reduces the discomfort and fatigue caused by long-time work, and greatly improves the work efficiency.
The INTJ-51A adopts a clutch handle. The user can move the platform flexibly by pressing the clutch wrench, without having to pinch the handle for a long time; Press the clutch button to cancel the rapid movement. Avoid hand numbness during long-time operation and speed up observation. INTJ-51A introduces a precision guide rail transmission mechanism, which makes the movement lighter and smoother, and the product more stable and reliable.
It is equipped with forward and backward gear switching modes, which can quickly and accurately locate the required observation magnification, and the repeated positioning accuracy is high. The mechanical switching mode effectively improves the service life of the converter.
The INTJ-51A objective lens and aperture diaphragm adopt a brand-new electric control system, and its operation keys are located in the front of the instrument, so that you can reach them. The humanized electric design not only avoids frequent manual operation steps, but also makes your detection more accurate and flexible.
The fuselage is supported by six end brackets, with a low center of gravity and a high stability all metal frame. It has a good anti-seismic function to ensure the stability of image quality.
The INTJ-51A fuselage is made of all metal materials, with excellent stability. There are built-in handling devices at both ends of the bottom. During handling, users only need to rotate and screw out the built-in handling handle and screw it in in in the opposite direction to form a solid handling device. The setting of this device can evenly distribute the weight of the machine, and only two people are needed to complete the handling, effectively avoiding many problems in the handling process, such as no way to start, difficult movement, uneven weight distribution, collision and so on. In order to prevent damage caused by the movement of the instrument platform during handling, the platform can be locked to ensure the safety and stability of the instrument.
The aperture diaphragm and objective lens magnification are automatically matched without manual adjustment, which is faster and more efficient, allowing different users to have the same observation effect. In the dark field mode, the diaphragm opens automatically, which reduces the professional technical requirements of the user for the microscope and simplifies the microscopic observation.
● the newly upgraded INTJ-51AMOT, fully automatic operation mode, makes your detection work more efficient.
● X\Y\Z three axis electric control, electric objective lens conversion, and automatic aperture diaphragm matching.
● the movement of X, y and Z axes of the 12 inch platform can be controlled by software or handle to complete the image mosaic function and perfectly observe and analyze the global image.
● the independent operating handle makes the platform movement more simple and convenient, and avoids the platform damage caused by improper operation of personnel.
INTJ-51A integrates various observation functions such as bright field, dark field, polarizing, DIC, etc. It is widely used in semiconductor, FPD, circuit packaging, circuit substrates, materials, castings, cermet parts, precision abrasives, etc.
Various accessories can meet a variety of working environments and observation modes to show you real and clear microscopic images.
● An eyepiece with 25mm wide field of view is configured. Compared with the conventional 22mm field of view, the field of view is more flat and broad, and the edges of the field of view can be clear and bright, giving users a more comfortable visual experience.
● provide a more flat observation range and improve work efficiency. The larger range of diopter adjustment can meet the needs of more users.
● Equipped with a full set of professional semi achromatic metallographic objective lenses, high transmittance lenses and advanced coating technology.
● The long working distance design can effectively avoid the collision between the objective lens and the sample when the user switches. 20x long working distance objective lens is configured to meet the needs of industrial testing field.
● Each lens is strictly selected with high transmittance lens and advanced coating technology, which can truly restore the natural color of the sample.
Model | Magnification | Numerical aperture | Working distance | Cover glass thickness | Parfocal distance | Conjugate distance |
（N.A） | (mm) | (mm) | (mm) | (mm) | ||
Infinite bright and dark field semi vanishing metallographic DIC objective | 5X | 0.15 | 13.5 | - | 45 | ∞ |
10X | 0.3 | 9 | - | |||
20X | 0.5 | 2.5 | 0 | |||
50X | 0.8 | 1 | 0 | |||
100X | 0.9 | 1 | 0 | |||
Infinite long working distance bright and dark field semi vanishing metallographic DIC objective | 20X | 0.4 | 8.5 | 0 | 45 | ∞ |
Semi complex metallographic objective with infinite working distance in bright and dark field | 50X | 0.55 | 7.5 | 0 | 45 | ∞ |
100X | 0.8 | 2.1 | ||||
Infinite bright field semi complex elimination DIC objective | 5X | 0.15 | 19.5 | - | 45 | ∞ |
10X | 0.3 | 10.9 | - | |||
20X | 0.5 | 3.2 | 0 | |||
50X | 0.8 | 1.2 | 0 | |||
100X | 0.9 | 1 | 0 |
● With high-performance differential interference module, the subtle height difference that cannot be detected under bright field observation can be transformed into high contrast shading difference and displayed in the form of three-dimensional relief. It is widely used in LCD conductive particles, precision disk surface scratch detection and other fields.
Optical system | Infinite chromatic aberration correction optical system |
Observation method | Bright field / dark field / polarization/DIC |
Observing tube | Infinite hinged tee observation tube, 0-35 ° angle adjustable, positive image, pupil distance adjustment: 50-76mm, spectral ratio 100:0 or 0:100 |
Eyepiece | High eye point large field flat field eyepiece pl10x/25mm, visibility adjustable, with single scale cross dividing plate |
Objective | Infinite bright and dark field semi vanishing metallographic DIC objective 5X 10X 20X 50X 100X |
Infinite long working distance bright and dark field semi vanishing metallographic DIC objective 20X | |
Infinite long working distance bright and dark field semi vanishing metallographic objective 50X 100X | |
Converter | Light and dark field six hole electric converter with DIC slot |
Rack group | Reflective frame, front low hand coarse micro coaxial focusing mechanism. Rough adjustment stroke is 35mm, and fine adjustment accuracy is 0.001mm. It is equipped with an adjusting and tightening device to prevent sliding and a random upper limit device. Built in 100-240V wide voltage system. |
Transparent and reflective frame, front low hand coarse and micro coaxial focusing mechanism. Rough adjustment stroke is 35mm, and fine adjustment accuracy is 0.001mm. It is equipped with an adjusting and tightening device to prevent sliding and a random upper limit device. Built in 100-240V wide voltage system. | |
Stage | Right hand position 14 × 12 inch three-layer mechanical mobile platform, coaxial adjustment in X and Y directions of low hand position; Platform area: 718mmx420mm, moving range: 356mmx305mm; With clutch handle, it can be used for rapid movement within the full stroke range; Glass carrier plate (for reflection). |
Electric platform | Electric platform: Area: 495mmx641mm, moving range: 306mmx306mm; The software controls the X and Y movements and repeats the positioning accuracy, (3+l/50) μm with flat platform. |
Lighting | Bright and dark field reflection illuminator, with variable electric aperture diaphragm, field diaphragm and adjustable center; With light and dark field lighting switching device; With color filter slot and polarizer slot. |
Photographic accessories | 0.5X/0.65X/1X camera adapter, C-type interface, focusing. |
Others | Polarizer insert plate, fixed polarizer insert plate, interference filter group for reflection; High precision micrometer; DIC assembly. |
Camera | Equipped with 6MP, 12MP and 20MP HD CCD cameras availble. |
Software | Professional measurement software and customized detection software. |
