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Semiconductor Inspection Metallographic Microscope INTJ-51M

All operations of the wafer semiconductor inspection microscope INTJ-51M series are designed according to ergonomics to reduce operator fatigue. Its modular component design allows free combination of system functions. It covers a variety of observation functions such as bright field, dark field, oblique illumination, polarization, DIC differential interference, etc., and can be selected according to the actual application.
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  • INTJ-51M

  • CAIDAO

Wafer semiconductor inspection microscope

All operations of the wafer semiconductor inspection microscope INTJ-51M series are designed according to ergonomics to reduce operator fatigue. Its modular component design allows free combination of system functions. It covers a variety of observation functions such as bright field, dark field, oblique illumination, polarization, DIC differential interference, etc., and can be selected according to the actual application.

1. Wide field hinged three eye observation tube

The three eye observation cylinder with positive image hinge has the same imaging orientation as the actual direction of the object, and the moving direction of the object is the same as the moving direction of the image plane, which is convenient for observation and operation.


INTJ-51M P2



2. Design of large stroke mobile platform

6-inch flat platform design, 158mm×158mm, which can be used for wafer or FPD detection of corresponding size, and also for array detection of small-size samples.

3. High precision objective lens converter

The converter adopts precision bearing design, which makes the rotation feel light and comfortable, and has high repeated positioning accuracy. The concentricity of the objective lens after conversion is also well controlled. The converter with different hole positions can be configured according to the needs.


INTJ-51M P3




4. Stable frame structure design

The industrial inspection grade microscope body and the low center of gravity, high rigidity and high stability metal frame ensure the seismic resistance and imaging stability of the system.

Its front low hand coarse fine tuning coaxial focusing mechanism, built-in 100-240V wide voltage transformer, can adapt to the power grid voltage in different regions. Air circulation cooling system is designed inside the base, which will not overheat the rack after long-term use.


INTJ-51M P4

Semiconductor inspection microscope INTJ-51M technique parameters

Optional observation methods

Bright field / dark field / polarized light /DIC/ transmitted light

Optical system

Infinite chromatic aberration correction optical system

Eyepiece

PL10X/22 Flat field high eye point eyepiece

Objective

LMPL-BD Infinitely long working distance metallographic objective 5X、10X、20X、50X、100X (optional)

Observation tube

Positive image observation cylinder, 25 ° hinged three eyes, spectral ratio, binocular: three eyes =100:0 or 0:100

Converter

5-hole tilt in converter with DIC slot

Stage

6 "three-layer mechanical mobile platform, reflection stroke 158x 158mm, transmission stroke: 100x100mm, right-hand X and Y mobile handwheels, with clutch handle, can move quickly.

Microscope body

Coarse fine adjustment coaxial, coarse adjustment stroke 33mm, fine adjustment accuracy 0.001mm, with coarse adjustment mechanism upper limit and elastic adjustment device. Built in 90-240v wide voltage transformer, dual power output.

Reflex illuminator system

With variable field of view diaphragm and aperture diaphragm, the center can be adjusted; With color filter slot and polarizing device slot; With diagonal lighting switching rod. 12v100w halogen lamp with continuously adjustable light intensity (MX-6R microscope body should be used when selecting this group of illuminators).

Transmission lighting system (optional)

Single high-power 5W led, white, continuously adjustable light intensity. N. A. 0.5 condenser with variable aperture diaphragm.



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